Separate particles from gel and chemistry effects
Photoresist defects can be influenced by hard particles, soft agglomerates, gels, formulation age, shear history and dispense-system conditions. Filter selection should be tied to the observed failure mode and validation method, not only to a smaller nominal label.
HDPE, nylon and PTFE play different roles
HDPE lithography cartridges
All-HDPE construction supports high-cleanliness photoresist and compatible solvent duties. Product selections extend from 50 nm to sub-1 nm labels, subject to test-method and application confirmation.
Nylon lithography cartridges
Nylon may provide useful adsorption behaviour for gel-like contaminants in compatible photoresist and solvent applications. Chemical compatibility and extractables must be reviewed.
PTFE options
PTFE membrane options are available in compact point-of-use formats where chemistry and process conditions support their use.
Point-of-use formats
Compact 0.5 L and 1 L assemblies provide HDPE, nylon and selected PTFE membrane configurations for developer, DI water, solvent and lithography chemical positions. The 0.5 L family uses an HDPE structure; the 1 L family uses a PP housing and cage with HDPE support.
Compare lithography filter specifications
Compare Zhongfu engineered filters with complementary UPE, PES, capsule and laboratory routes →
Data to include in an RFQ
- Chemical type, formulation family and SDS.
- Viscosity, flow, pressure, temperature and allowable pressure drop.
- Bulk, recirculation, final or POU position.
- Current filter part number, fitting and housing or bracket.
- Defect mode and particle or gel qualification method.
Sub-1 nm and nanometre product labels are selection identifiers. Request the corresponding retention and qualification method before drawing process conclusions.