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Selected ceria slurry duties

CMP slurry production filtration.

Hydrophilic nylon cartridge screening for selected ceria slurry production and associated DI-water or compatible solvent positions.

Control oversize material without damaging the useful distribution

CMP slurry filtration must balance agglomerate control against removal or alteration of the intended abrasive population. Slurry chemistry, solids loading, particle-size distribution, viscosity, shear and recirculation history belong in the selection review.

Hydrophilic nylon cartridge family

The Zhongfu CMP nylon family uses a hydrophilic nylon membrane with PP cage, end caps and support. Screening options include 0.45 µm, 0.2 µm and 0.1 µm in 10- and 20-inch formats, with EPDM seals, a published maximum temperature of 70°C and maximum forward differential pressure of 0.5 MPa at 50°C.

View CMP nylon specifications

Compare Zhongfu nylon with complementary graded-depth PP and integrated PP routes →

Validate with the real slurry

  • Compare incoming and filtered particle-size distribution.
  • Track clean and loaded pressure drop at process flow.
  • Review slurry stability, solids loss and defect-relevant agglomerates.
  • Use representative recirculation, temperature and hold time.

Data to include in an RFQ

Provide slurry type, abrasive, solids loading, viscosity, particle-size distribution, batch or recirculation duty, flow, pressure, temperature, current filter, acceptance criteria, quantity and destination.

This page addresses selected production-filtration duties. It does not establish suitability for every CMP formulation or direct wafer-tool application.

Review a CMP slurry filtration duty.

Send the abrasive system, solids loading and validation target.

Start an RFQ