Application library
Follow the process, not the catalogue.
Liquid and gas applications are separated because their contamination mechanisms, safety inputs and qualification methods are different.
Liquid applications
DIW & UPWProcess water, rinse and tool point of use→Photoresist & developerParticles, gels, bubbles and hold-up→Wet etch & cleanAcid, base and cleaning chemistry→Electronic chemicalsProduction, final filtration and CDS→CMP slurryLarge-particle control without arbitrary pore matching→Gas applications
Bulk gas distributionFacility flow, pressure loss and particle control→Specialty & process gasExact-gas filtration and impurity removal→Gas purificationMolecular impurity control by gas and target species→Tool & chamber protectionComponent filters, diffusers and flow restrictors→Qualification sequence
Five inputs determine the first technical screen.
Provide the media or gas, process position, contamination target, operating envelope and required approval evidence. A pore label or catalogue image alone is not a process approval.
MEDIAChemical, DIW quality or exact gas composition.
POSITIONBulk, final, recirculation, distribution or POU.
TARGETParticle, gel, metal, extractable or molecular impurity.
ENVELOPEFlow, pressure drop, temperature, pressure and connection.
APPROVALTest method, documents, sample plan and acceptance criteria.
Share the process condition.
We will identify the missing inputs before recommending a product route.